| 摘要 |
PROBLEM TO BE SOLVED: To prevent the appearance of deviation in position of a pattern of an X-ray absorber, by building an X-ray mask wafer from a mask substrate made of X-ray permeable substance, the pattern of the X-ray absorber, and a supporter and adhering a reinforcing frame to the supporter at two or three points. SOLUTION: A membrane 2 made of SiC or the like which serves for a mask substrate is formed on a silicon substrate 1 as a supporter. After that, the silicon substrate 1 is etched back to expose part of the rear face of the membrane 2. Then, a supporting ring 7 which is a reinforcing frame is adhered to the rear face of the silicon substrate 1 at two points with an adhesive 8. Nextly, an antireflection film 3, an X-ray absorber 4, and an etching mask 5 are formed in order on the membrane 2. Then, resist 6 is applied onto the etching mask 5 and then is baked. During baking, the X-ray mask wafer and the supporting ring 7 are fastened to each other by a vice. |
