| 摘要 |
PROBLEM TO BE SOLVED: To accurately transfer a mask pattern by baking so as to avoid the phenomenon that generation of light leaking from a mask substrate differs due to the difference of the polarizing direction of an irradiating light from the opening direction of the mask substrate. SOLUTION: Two linearly polarized parallel light beams 2, 3 may be of a constitution for switching on and off two beams slit from a single optical source, using a shutter, etc., or of two light sources, the parallel light beams 2, 3 are incident on incident planes 4, 5 of an optical block 1, reflecting planes 6, 7 reflect the beams 2, 3 approximately 100% and are mirror-surfaces coated with, e.g. Al, etc., the light beams 2, 3 reflected at the reflective planes 6, 7 are incident on stage planes 8 approximately in the same range, wherein the incident angles of the light beam incident on the stage planes so as to set for the total reflection of the stage planes. |
