发明名称 VERTICAL TYPE THIN-FILM TRANSISTOR AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To provide a TFT(thin-film transistor) and its manufacturing method by which ON-state current can be improved by forming a channel in consideration of the crystal structure of a polycrystalline semiconductor film formed of amorphous semiconductor film. SOLUTION: In a TFT 1, a channel formation area 3 is formed of a polycrystalline semiconductor film 301 which is formed by crystallizing an amorphous semiconductor film and has a columnar structure where a column axis A is directed toward the outside of the surface of a board 8. A gate electrode is opposite to a side end face 302 almost parallel to the prism axis A of the polycrystalline semiconductor film 301 constituting the channel formation area 3, with a gate insulation film 6 in between.
申请公布号 JPH11284191(A) 申请公布日期 1999.10.15
申请号 JP19980084656 申请日期 1998.03.30
申请人 SEIKO EPSON CORP 发明人 TAKENAKA SATOSHI
分类号 H01L29/786;H01L21/336;(IPC1-7):H01L29/786 主分类号 H01L29/786
代理机构 代理人
主权项
地址