| 摘要 |
PURPOSE: To obtain a compsn. for a surface reflection preventing film for a photoresist having a low refractive index of <=1.4, forming a coating film which can be satisfactorily removed with an aq. medium and not causing the problem of residue (scum), etc. CONSTITUTION: In this compsn. consisting essentially of a water-soluble fluorine compd. and water, a water-soluble fluorine compd. which is solid at 20 deg.C under 1atm. and a water-soluble fluorine compd. which is liq. at 20 deg.C under 1atm and has >=100 deg.C b.p. under 1atm are contained as the water-soluble fluorine compd. |
