发明名称 Immersion lens for electron beam projection system
摘要 The immersion lens has a first magnetic lens arrangement (30) with a bore for the passage of an incident electron beam, which generates a first magnetic field. A second magnetic lens (35) generates a second magnetic field which converges the electron beam. The combined magnetic field converges the beam between the first and second lens arrangements. The second magnetic lens arrangement contains a permanent magnet. An Independent claim is also included for an electron beam projection system.
申请公布号 DE19915572(A1) 申请公布日期 1999.10.14
申请号 DE19991015572 申请日期 1999.03.30
申请人 ADVANTEST CORP. 发明人 TANAKA, HITOSHI
分类号 H01J37/14;G01Q60/50;G03F7/20;H01J37/141;H01J37/28;H01J37/305;H01L21/027;(IPC1-7):H01J3/20;H01J37/10 主分类号 H01J37/14
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