| 摘要 |
<p>The invention concerns a self-aligned non-volatile storage cell in which a MOS transistor with source and drain regions (6) is introducted into the surface region of a semiconductor body (1). The floating gate (12) and control gate (16) of the MOS transistor are housed in overlapping manner in a trench (8), while the transistor channel (17) is guided laterally in a surface region of the trench (8).</p> |
