首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
SEMICONDUCTOR SILICON SUBSTRATE
摘要
申请公布号
JPH11278991(A)
申请公布日期
1999.10.12
申请号
JP19980100257
申请日期
1998.03.27
申请人
SHIN ETSU HANDOTAI CO LTD
发明人
SHINOMIYA MASARU
分类号
H01L21/322;C30B29/06;(IPC1-7):C30B29/06
主分类号
H01L21/322
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Method and apparatus for automatic furnace
Apparatus for applying hot-melt glue to edge of sheet stack
Rotary valve seal assembly
PRODUCING PULSEEPRESSURE SYSTEM
Mobile infrared apparatus for mapping thermal variations and method employing same
Multiple bingo game apparatus
Air-fuel ratio regulating apparatus for an internal combustion engine with exhaust gas sensor characteristic compensation
Auxiliary two-speed transmission
Coke discharging system
Alkyl-substituted 6-chloro-2-thiouracils
Rapid parison cooling in injection blow molding
AIR BRAKE SYSTEM DISTRIBUTES PRESSURE OF BRAKE THAT MOVES ACCORDIG TO LOADS
Device for use on a film projector for copying films
Method for preparing hydrocarbon conversion catalyst
Inverter control system
Oxadiazepine cationic dyestuffs
Superconducting cable cooling system by helium gas and a mixture of gas and liquid helium
Fuel injection type rotary piston engines