Apparatus and method for scratch wear testing of thin films

摘要

Methods and apparatus are provided for generating scratch wear resistance information on a given specimen 13 by measuring off-specular light scattering. The technique employs a focused light beam 10 that illuminates the area of the specimen surface which is scratched or otherwise altered by a stylus 5 pressed to this surface with a determined force (load). The stylus is slid along this surface with a determined speed and for a determined distance. In a preferred embodiment, the specimen is mounted on a turntable 4, and the stylus and the optical elements are stationary. The light scattering intensity is measured using a light detector 7 continuously or quasi-continuously and data is evaluated using a computer 9.