发明名称 Improvements in relation to pattern forming methods
摘要 A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.
申请公布号 GB2335282(A8) 申请公布日期 1999.10.12
申请号 GB19980005320 申请日期 1998.03.13
申请人 KODAK POLYCHROME GRAPHICS COMPANY LTD. 发明人 KEVIN BARRY RAY;CHRISTOPHER DAVID MCCULLOUGH
分类号 B41C1/10;B41M5/36;G03F7/021;(IPC1-7):G03F7/021;B41M5/40;G03F7/004 主分类号 B41C1/10
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