发明名称 |
Improvements in relation to pattern forming methods |
摘要 |
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed. |
申请公布号 |
GB2335282(A8) |
申请公布日期 |
1999.10.12 |
申请号 |
GB19980005320 |
申请日期 |
1998.03.13 |
申请人 |
KODAK POLYCHROME GRAPHICS COMPANY LTD. |
发明人 |
KEVIN BARRY RAY;CHRISTOPHER DAVID MCCULLOUGH |
分类号 |
B41C1/10;B41M5/36;G03F7/021;(IPC1-7):G03F7/021;B41M5/40;G03F7/004 |
主分类号 |
B41C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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