发明名称 FORMATION OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To ensure good film forming property and to enhance and stabilize film quality by regulating the surface temp. of a substrate immediately before coating with a chemical soln. to a temp. at least exceeding ambient temp. SOLUTION: A thin film is preferably formed in an environment at 25±15 deg.C ambient temp. and <=70% relative humidity. The temp. of the substrate at the time of coating with a chemical soln. is regulated to a temp. at least exceeding the ambient temp. The temp. differenceΔT deg.C between the temp. of the substrate at the time of coating and the ambient temp. of a coating chamber is preferably >0 to 80 deg.C. An alcoholic soln. of ter- and quarterfunctional metal alkoxides or a soln. contg. a fluoroalkyl-contg. silane compd. is used as the chemical soln. A glass, plastic, metallic or ceramic substrate is used as the substrate. The temp. regulating method is not particularly limited and heating with an electric heater or hot water may be adopted.
申请公布号 JPH11278867(A) 申请公布日期 1999.10.12
申请号 JP19980085295 申请日期 1998.03.31
申请人 CENTRAL GLASS CO LTD 发明人 HAMAGUCHI SHIGEO;AKAMATSU YOSHINORI
分类号 C01G23/00;C03C17/00;C03C17/25;C03C17/30;(IPC1-7):C03C17/00 主分类号 C01G23/00
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