| 摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to continuously decompose a fluorocarbon at a comparatively lower temperature and with high efficiency by bringing a gas containing the fluorocarbon into contact with an eliminator containing an aluminum oxide as an active principle at a specific temperature to decompose the fluorocarbon and thereby forming aluminum fluoride. SOLUTION: When a gas containing a fluorocarbon is treated with a fluorocarbon decomposition treatment device structured of elimination columns 1, 1' aligned in two parallel rows, eliminators 2, 2' containing an aluminum oxide as an active principle are charged in the elimination columns 1, 1', respectively. The fluorocarbon is decomposed by bringing the gas into contact with the eliminators 2, 2' at 400 deg.C or higher to decompose the fluorocarbon and, consequently, aluminum fluoride is formed. Further, the eliminators 2, 2' which are no longer capable of decomposing the fluorocarbon are regenerated by bringing the eliminators 2, 2' into contact with the gas containing water vapor under heat. The fluorine fixed as the aluminum fluoride in the eliminators 2, 2' is discharged as hydrogen fluoride, and aluminum is recycled as aluminum oxide.</p> |
