发明名称 MASK, AND METHOD AND DEVICE FOR MANUFACTURING MASK
摘要 <p>PROBLEM TO BE SOLVED: To obtain a circuit pattern having size exactly as designed by generating generation data on a pattern element so that the line width at an isolated edge of the pattern element or at an edge nearby a terminal is different from designed line width. SOLUTION: Inspection bits set in an elliptic tester Bpx all have a logical value '0', so it is judged that the pattern edge part positioned at a point Apx of interest is isolated. At this time, the pattern edge is expanded by a certain quantity in the opposite direction (-X direction) from the scanning direction of the point Apx of interest. Then it is judged whether the edge part at the point of interest is nearby the long-side terminal part of a pattern PA by using testers DAp, DBp, and DCp, testers EAp, EBp, and ECp, and a linear tester Cpx. Here, the inspection bits in the two blade type testers DAp and EAp all have a logical value '1' (pattern), so it is not judged that the edge part at the point Apx of interest is not nearby the lengthwise terminal part, and a correction quantity (thickening quantity) for the line width at the edge part at the point Apx of interest is regarded asΔL.</p>
申请公布号 JPH11271957(A) 申请公布日期 1999.10.08
申请号 JP19990001414 申请日期 1999.01.06
申请人 NIKON CORP 发明人 SHIRAISHI NAOMASA
分类号 G03F1/36;G03F1/68;G03F1/70;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/36
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