摘要 |
<p>PROBLEM TO BE SOLVED: To provide an integrated circuit design method by which the mask pattern corresponding to various design rules can be formed suitably, by enhancing the efficiency of work in a circuit design stage. SOLUTION: At the designing of a circuit element required for a mask pattern for designing integrated circuit in an integrated circuit design method, the shrunk circuit variables of the circuit element obtained by shrinking the mask pattern of the circuit element is calculated, based on the unshrunk circuit variable of the circuit element, and both the unshrunk and shrunk circuit variables are displayed on a display device 290.</p> |