| 摘要 |
PROBLEM TO BE SOLVED: To obtain a process for producing a reflection plate having high reflection intensity over a wide range by subjecting the surface of a reflection plate body formed with the surface layer of plural metals varying in etching rates to an etching treatment, thereby forming an irregular reflection layer on the surface of the reflection plate body. SOLUTION: The surface layer is formed on the reflection plate 1 body by the metal different in the etching rate from the metal forming the reflection plate 1 body. The reflection plate 1 body is heated near to the m.p. of two kinds of the metals to form eutectic bodies of various grain sizes. The surface layer where the eutectic bodies are generated is subjected to the etching treatment. The grain sizes of the eutectic bodies generated in the surface layer are various sizes and, therefore, recessed parts 14 formed on the surface layer have random shapes. When light is cast on the reflection plate 1 having such surface layer, the better irregular reflection than that of the conventional reflection plate 1 occurs and the reflection luminance is enhanced in the wide range. The reflection characteristics thereof have the high reflection intensity and exhibit the relatively broad reflection characteristics. |
