发明名称 |
AUTOMATIC FLUORINE CONTROL SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To control fluorine concentration in a laser chamber accurately by providing a fluorine monitor for monitoring the fluorine concentration and feeding a signal back to an automatic control system in order to operate a laser in a sweet spot. SOLUTION: A voltmeter 38 monitors the charge voltage of a high voltage source 36 and provides a signal to a feedback control circuit 40 delivering a control signal to a low flow control valve 42 in order to increase/decrease the continuous fluorine injection rate from a gas bottle 44 when it is required for sustaining a high voltage within a narrow desired range. Fluorine concentration is measured at an interval of about 8 hours by a fluorine monitor. A pressure regulator 46 sustains the pressure in a chamber 20 at 3 atm by feeding a releasing gas into a fluorine monitor tank 48 being sustained sequentially at 2 atm through a pressure regulator 50 thus sustaining a substantially constant fluorine concentration. |
申请公布号 |
JPH11274610(A) |
申请公布日期 |
1999.10.08 |
申请号 |
JP19990023954 |
申请日期 |
1999.02.01 |
申请人 |
CYMER INC |
发明人 |
CARLESI JASON R;ROKNI SHAHRYAR;GONG MENGXIONG;WATSON TOM A;DAS PALASH P;MICHAEL C BINDER;MURIYADII TANTORA;DAVID J TAAMAGGI;DANIEL G PATERSON |
分类号 |
G03F7/20;H01S3/036;H01S3/225;(IPC1-7):H01S3/036 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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