PLASMA PROCESSOR AND PLASMA PROCESSING METHOD,申请号JP19980072575-传众专利搜索

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发明名称	PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
摘要
申请公布号	JPH11274141(A)	申请公布日期	1999.10.08
申请号	JP19980072575	申请日期	1998.03.20
申请人	HITACHI LTD;HITACHI KASADO ENG CO LTD;HITACHI TECHNO ENG CO LTD	发明人	WATANABE KATSUYA;ICHIMARU SEIJI;MUTO SATORU
分类号	H01L21/302;H01L21/205;H01L21/3065;(IPC1-7):H01L21/306	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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