| 摘要 |
PROBLEM TO BE SOLVED: To obtain the photoresist composition reduced in transparency and superior in various characteristics, such as sensitivity, resolution, coatability, profile and pattern shape, by incorporating a resin having specified structural units. SOLUTION: The photoresist composition comprises as its one component the resin having the structural units each represented by the formula in which each of R<1> -R<3> is, independently, an H atom or a 1-4C alkyl; R<4> is an H atom or a 1-4C alkyl or 1-4C alkoxy group; R<5> is an H atom or an alkyl or aryl group or R<4> and R<5> may combine with each other to form a hetero ring or the like ring together with the their 2 combined C atoms; and R<6> is an H atom or a 1-4C alkyl or 1-4C alkoxy or hydroxy group, thus permitting transparency to be controlled by incorporating this resin into the photoresist. |
