| 摘要 |
PROBLEM TO BE SOLVED: To ensure both good i-line transmittance and low residual stress after imidation, to give a high resolution pattern of a good shape and to form a polyimide film having good mechanical characteristics and high heat resistance by incorporating a polyimide precursor having specified repeating units. SOLUTION: A polyimide precursor having repeating units represented by formula I is incorporated. In the formula I, X is a tetravalent org. group, Y is a tri- or higher valent org. group, R<1> is a group represented by formula II, R<2> and R<3> are each hydroxyl or a monovalent org. group and (m) is >=1. In the formula II, Z is a group contg. a photo- or thermopolymerizable C-C double bond. The polyimide precursor can be produced by a known production process and can be synthesized, e.g. by synthesizing a polyamic acid from a tetracarboxylic acid dianhydride and amine compds. including triamine in an org. solvent and allowing a carboxylic acid having a thermo- or photopolymerizable double bond or its anhydride to react with the amino residues of the synthesized polyamic acid. |
