发明名称 |
Shimming substrate holder assemblies to produce more uniformly polished substrate surfaces |
摘要 |
A substrate holder assembly for retaining a substrate during chemical mechanical polishing is described. The substrate holder assembly includes: (i) a backing plate including a contact surface adapted for supporting components of the substrate holder assembly and the substrate; (ii) a shim positioned adjacent the contact surface of the backing plate for applying pressure on the substrate during chemical-mechanical polishing; and (iii) a carrier film disposed adjacent the shim such that at least a portion of the carrier film adjacent the shim protrudes outwardly.
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申请公布号 |
US5961375(A) |
申请公布日期 |
1999.10.05 |
申请号 |
US19970960925 |
申请日期 |
1997.10.30 |
申请人 |
LSI LOGIC CORPORATION |
发明人 |
NAGAHARA, RONALD J.;LEE, DAWN M. |
分类号 |
B24B41/06;H01L21/687;(IPC1-7):B24B7/00 |
主分类号 |
B24B41/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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