发明名称 PRODUCTION OF THIN FILM FORMING COMPOSITION AND THIN FILM USING THE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a high purity compsn. by adding a metal salt, metal chelate or metal alkoxide to a soln. prepared by diluting an alkyl amine with an org. solvent such as a hydrocarbon. SOLUTION: A soln. prepared by diluting an alkylamine with an org. solvent such as an aromatic hydrocarbon or other hydrocarbons is brought into contact with an aq. soln. of salts of metals in groups III to V, group VIII, group VIa, group VIIa, group Ib or group IIb, the pH of which is previously controlled, so as to extract the metal salts in the org. solvent phase while the water phase is separated and removed to obtain a soln. containing a metal alkylamine complex. Or, further the org. solvent used for extraction is removed by vaporization and distillation, and an org. solvent for substitution such as hydrocarbons, alcohols, esters,β-diketoesters, ethers,β-diketones, glycols or mixtures of these is added to the obtd. soln. By using the thin film forming compsn. thus prepared, a metal or metal oxide thin film is formed on a substrate by a coating and pyrolyzing method or a CVD method.
申请公布号 JPH11269656(A) 申请公布日期 1999.10.05
申请号 JP19980114105 申请日期 1998.03.20
申请人 KOJUNDO CHEM LAB CO LTD 发明人 TANAKA MINORU;NAGAO JUNKO;YOKOYAMA HIDECHIKA
分类号 C23C18/12;C23C16/18;(IPC1-7):C23C18/12 主分类号 C23C18/12
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