| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist material showing heat resistance and high resolution by using a polymer which comprises a p-ethoxystyrene unit, a p-hydroxystyrene unit, a p-methylstyrene unit and the like. SOLUTION: A resist material is a polymer represented by formula I which contains monomer units represented by formulas II and III, the sum of II and III being 10-90 mol.% of the total polymer, the monomer unit of III being 1-25 mol.% of the total polymer, and has weight average molecular weight of 3,000-50,000, 100 pts.wt of said polymer and 1-30 pts.wt. of an acid generator such as a bis(1-methylethylsulfonyl)diazomethane are dissolved in 100-2,000 pts.wt. of a solvent to give a positive type resist material (R<1> is H or methyl; R<2> and R<3> are H, a 1-6C alkyl, phenyl or the like; R<4> is a 1-10C alkyl, acetyl or the like; R<5> is H, a halogen, 1-6C alkyl or the like; 0.10 <=(k+m)/(k+r+ m)<=0.90; and 0.10<=m/(k+r+m))<=0.25). |
