发明名称 Method of manufacturing an optical device with a groove accurately formed
摘要 A first layer (2) and a second layer (3) are formed on a substrate (1). The first layer is made of a resist against a groove-sculpturing etchant used in etching the substrate while the second layer is made of an anti-corrosive material against dry etching. The second layer is at first patterned into a patterned second layer (3a) in the form of a groove-sculpturing mask pattern (8). With the patterned second layer used as a mask, the first layer is etched and patterned into a patterned first layer (2a) in the form of the above-mentioned mask pattern. With the patterned first layer used as a mask, the substrate is etched to form a groove (9).
申请公布号 US5961683(A) 申请公布日期 1999.10.05
申请号 US19970781810 申请日期 1997.01.10
申请人 NEC CORPORATION 发明人 MIZUTA, SATORU;NISHIMOTO, HIROSHI
分类号 G02B6/12;G02B6/30;G02B6/36;(IPC1-7):C03B8/04 主分类号 G02B6/12
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