STRUCTURE FOR PREVENTING PARTICLE FROM BEING GENERATED, BY FLOW OF AIR IN SEMICONDUCTOR FABRICATION APPARATUS

摘要

PURPOSE: A structure is provided to prevent a particle from being generated by the air flow in a semiconductor fabrication apparatus, and particularly a spin scrubber(10) is provided which can prevent the generation of a particle by the air flow occurred in sending a wafer with a sending apparatus and by the flow of air supplied from the external. CONSTITUTION: A structure for preventing the generation of a particle by the flow of air has a number of holes on a frame corresponding to the direction of the air flow. The structure includes an air generation part enabling the air to flow in a fixed direction in the frame of a semiconductor device. The air generation part is arranged inside the frame and is reciprocated within a fixed range inside the frame.