发明名称 CONTROLLING METHOD OF SEMICONDUCTOR PROCESS USING FEEDBACK
摘要 <p>A method for controlling a semiconductor manufacturing process by failure analysis feedback compares a previous failure analysis result with current real-time process conditions. The method uses the steps of: a) establishing a monitoring data base with abnormal process condition data, the abnormal process condition data being obtained by a correlation between a yield for each manufactured lot and corresponding process conditions for semiconductor equipment when the yield is lowered or semiconductor equipment malfunctions have occurred; b) establishing an equipment data base by obtaining real-time process conditions for on-line semiconductor equipment; c) comparing the real-time process conditions for the on-line semiconductor equipment with the abnormal process conditions of the monitoring data base; and d) stopping the operation of the on-line semiconductor equipment when differences between the real-time and abnormal process conditions fall below a predetermined level.</p>
申请公布号 KR100200480(B1) 申请公布日期 1999.10.01
申请号 KR19950053372 申请日期 1995.12.21
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 LEE, MIN-HO
分类号 H01L21/66;G05B15/02;G05B19/418;H01L21/02;(IPC1-7):H01L21/66 主分类号 H01L21/66
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