| 摘要 |
PURPOSE: A clamp ring is provided to prevent an aluminum sticking phenomenon, by guaranteeing a sufficient interval between an inner surface of the clamp ring and a side of a wafer. CONSTITUTION: A clamp ring(10) has a circular ring shape whose central portion is opened for stably supporting a wafer(3) in a sputtering apparatus in an aluminum interconnection process. And, the clamp ring has several pads(12) protruded towards an inside of the circular ring. An inside diameter of the clamp ring except a portion where the pad is formed, is broader than an outside diameter of the wafer by at least 1.2 millimeter, so that an allowable error of about 0.6 millimeter can be maintained at right and left sides.
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