| 摘要 |
<p>A deposition resistant lining assembly is provided for a chemical vapor deposition chamber (350), the deposition resistant lining assembly including a first ceramic liner (300) for mounting adjacent a substrate holder (320) within the chemical vapor deposition chamber to protect a portion of an interior wall (360) of the chemical vapor deposition chamber from deposition of material on the portion of said interior wall of the chemical vapor deposition chamber. The deposition resistant lining assembly also includes a second ceramic liner (310) for mounting in a pumping channel (324) formed in a peripheral region of the chemical vapor deposition chamber to protect a portion of said pumping chanel from deposition of the material on the portion of the pumping channel. The first ceramic liner and the second ceramic liner are more resistant to deposition of the material than aluminum and easier and faster to clean of the material deposited thereon than aluminum.</p> |
