发明名称 Inspection of defects in a translucid film in the semiconductor process
摘要 The translucid film is coated with an anti-reflective layer, this prevents inspection light from penetrating the film, and reduces refraction of the light which may reduce the accuracy of inspection results. A method of inspecting for defects in translucid films comprises: (a) forming a translucid film (21a,b) on a semiconductor substrate (20); (b) forming a buffer layer (23a,b) of antireflective coating on the film and defects (22) for preventing inspecting light from penetrating it; (c) collecting and calculating the reflecting light message from the buffer layer to calculate inspection results.
申请公布号 DE19813744(A1) 申请公布日期 1999.09.30
申请号 DE19981013744 申请日期 1998.03.27
申请人 UNITED SEMICONDUCTOR CORP., HSINCHU 发明人 CHEN, ANCHOR
分类号 G01N21/95;G01N21/958;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N21/95
代理机构 代理人
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