发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING A MICROMECHANICAL DEVICE |
摘要 |
There is disclosed a method of manufacturing a micromechanical device. The method comprises the steps of: (a) etching a substrate (1), having a mask (2) thereon, through an opening in the mask to a desired depth to form a trench (6) having a side wall (4) and a base (5) in the substrate (1); (b) depositing a layer of a protecting substance (7) on the exposed surfaces of the substrate and mask; (c) selectively removing the protecting substance (7) from the base (5); and (d) etching the base (5) using a fluorine-containing etchant. Also disclosed is a micromechanical device formed by the method and an apparatus for manufacturing the micromechanical device.
|
申请公布号 |
WO9949506(A1) |
申请公布日期 |
1999.09.30 |
申请号 |
WO1999GB00774 |
申请日期 |
1999.03.16 |
申请人 |
SURFACE TECHNOLOGY SYSTEMS LIMITED;MCQUARRIE, ANDREW, DUNCAN |
发明人 |
MCQUARRIE, ANDREW, DUNCAN |
分类号 |
G01P9/04;B01J7/00;B01J12/00;B01J19/08;B01J19/24;B81B3/00;B81C1/00;C01B7/24;C07C17/00;G01C19/56;G01P15/08;G01P15/125;H01L21/306;H01L21/3065;H01L21/308;H01L29/84;(IPC1-7):H01L21/306 |
主分类号 |
G01P9/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|