发明名称 Organic gate sidewall spacers
摘要 Integrated circuit fabrication methods in which a disposable spacer (232) is formed of an organic material, such as parylene, in self-alignment to the sidewall of a gate structure. For example, this is useful for drain profile engineering, since a heavy implant can be spaced farther from the gate corner than the width of the normal sidewall spacer. <IMAGE>
申请公布号 EP0945897(A1) 申请公布日期 1999.09.29
申请号 EP19990200586 申请日期 1999.03.02
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 JOYNER, KEITH A.
分类号 H01L21/302;H01L21/3065;H01L21/312;H01L21/336;H01L21/8238;H01L27/092;H01L29/78 主分类号 H01L21/302
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