| 摘要 |
A photoresist composition which is particularly useful as a chemical amplification type photoresist is provided, wherein the photoresist composition contains a resin having a structural unit represented by the following formula (I) : <CHEM> wherein R<1>, R<2> and R<3> each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R<4> represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms and R<5> represents a hydrogen atom, alkyl group or aryl group, or R<4> and R<5> join together to form a ring, which may be heterocyclic; and R<6> represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a hydroxyl group.
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