发明名称 VACUUM PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing system executing highly accurate high efficiency processing while simplifying the processing work and shortening the period thereof. SOLUTION: When a cooling plate 13A moves from a first position T1 to a second position T2, a work W1 held by a work holder 9 is introduced into an ion source 2A. In the deposition, three actions of rotation, application of a bias voltage and cooling are transmitted simultaneously to the work W1 through a cooling pipe 12A and the cooling plate 13A. Furthermore, the work W1 is isolated electrically from a carrier 6 or a vacuum chamber 1 through a shaft 21 made of an insulating material.
申请公布号 JP2002158174(A) 申请公布日期 2002.05.31
申请号 JP20000353254 申请日期 2000.11.20
申请人 SONY CORP 发明人 HAYASHI HIROSHI;AMANO SHUNJI
分类号 C23C14/50;H01J37/317;H01L21/203;H01L21/265;H01L21/302;H01L21/3065;(IPC1-7):H01L21/203;H01L21/306 主分类号 C23C14/50
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