发明名称 THIN-FILM MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a thin-film manufacturing device which is constituted to carry out a susceptor from a reaction chamber, without exposing the inside of the reaction chamber to the outside air. SOLUTION: A thin-film manufacturing device 10 is constituted to form a thin film on the surface of a substrate 1, placed on a susceptor 12 set up in a reaction chamber 11 by introducing a source gas to the surface. After the thin film has been formed, the susceptor 12 is carried to a carrying-out chamber 19 adjacent to the reaction chamber 11 by means of a carrier 17. The substrate 1 and susceptor 12 can be preferably carried by means of the same carrier 17, while the substrate 1 is placed on the susceptor.
申请公布号 JPH11265852(A) 申请公布日期 1999.09.28
申请号 JP19980088056 申请日期 1998.03.17
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 HABUKA HITOSHI
分类号 H01L21/677;C23C16/44;C23C16/54;C30B25/02;C30B25/12;C30B35/00;H01L21/205;(IPC1-7):H01L21/205;H01L21/68 主分类号 H01L21/677
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