摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming the patterned metal electrode when the metal itself is hard to etch. SOLUTION: The pattern of the metal than is hard to etch is formed by converting the metal that is hard to etch into a plurality of metal components that can be etched in the region, wherein the metal than is hard to etch is removed. This method includes the step, which attaches a metal layer 8 that is hard to etch on a sacrifice metal composition layer 7 and an exposed region, the step, which forms a plurality of metal compositions that can be etched by the reaction of the sacrifice metal composition layer 7 and the metal 8 that is hard to etch, and the step, which selectively removes the plurality of the metal compositions that can be etched and makes to remain the patterned metal layer that is hard to etch on the surface. |