发明名称 EQUIPMENT AND METHOD FOR GROWING SEMICONDUCTOR CRYSTAL
摘要 PROBLEM TO BE SOLVED: To grow a semiconductor single crystal without contaminating the grown single crystal with impurities other than dopant impurities and oxygen and also to enhance the rotational symmetry of a semiconductor melt, in semiconductor crystal growth using a magnetic field- and current-applied Czochralski method. SOLUTION: An electrode formed out of a material having the same composition as that of the semiconductor single crystal to be grown is used as an electrode 6 for applying current to a semiconductor melt 2 retained in a magnetic field to pass the current through between the semiconductor melt 2 and a growing semiconductor single crystal 3. Also, the position 8 at which the electrode 6 is brought into contact with the semiconductor melt 2, is adjusted to a level higher than that of the principal surface 7 of the semiconductor melt 2.
申请公布号 JPH11263691(A) 申请公布日期 1999.09.28
申请号 JP19980065174 申请日期 1998.03.16
申请人 NEC CORP 发明人 WATANABE MASATO;EGUCHI MINORU
分类号 H01L21/208;C30B15/00;C30B15/20;C30B29/06 主分类号 H01L21/208
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