发明名称 SHADOW MASK ASSEMBLY
摘要 PROBLEM TO BE SOLVED: To provide a shadow mask assembly capable of dispersing the generating position of a deformation accompanying an impact force when an impact is added to the shadow mask, and suppressing the entire deformation of a shadow mask. SOLUTION: This shadow mask assembly is formed of a shadow mask 2 having a porous part having a number of electron beam passing holes, a non- porous part 4 continued to the periphery of the porous part 3, and a skirt part 5 suspended and bent from the periphery of the non-porous part 4; and a support frame spot-welded to weld parts 6L, 6S provided in four edges of the skirt part 5 to hold the shadow mask 2. Each weld part 6L, 6S has a horizontally long form extending from the skirt part 5 to its height direction with the vertical center line 8Y or horizontal center line 8X of the shadow mask 2 as the center, and it is spot-welded within the range satisfying 0.3×(W/2)>D>0.12×(W/2) when the lateral width of the skirt part 5 is W, and the distance from the center line 8Y, 8X to a welding point 7(1), 7(2) is D.
申请公布号 JPH11265664(A) 申请公布日期 1999.09.28
申请号 JP19980068706 申请日期 1998.03.18
申请人 HITACHI LTD;HITACHI DEVICE ENG CO LTD 发明人 NAKANO YOSHIKI;NAKAMURA SHIGEKI;NAKAYAMA FUMINO;OSAKA HIDEYUKI;FURUSAWA TAKEHARU
分类号 H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J29/07
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