发明名称 METHOD FOR PROCESSING PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To omit heating after exposure and to improve printing durability and soiling resistance. SOLUTION: As for this processing method; a photosensitive planographic printing plate constituted by successively laminating a photopolymerizable photosensitive layer whose film thickness is 1.2 to 4 g/m<2> and a protective layer whose film thickness is 2 to 8 g/m<2> on a supporting body whose center line average roughness (Ra) is >=0.35μm is developed with developer incorporating alkali metal silicate after laser exposure, and then exposed all over the surface.
申请公布号 JPH11265069(A) 申请公布日期 1999.09.28
申请号 JP19980066688 申请日期 1998.03.17
申请人 MITSUBISHI CHEMICAL CORP 发明人 TOSHIMITSU ERIKO
分类号 G03F7/11;B41N1/08;B41N3/03;G03F7/00;G03F7/027;G03F7/09;G03F7/40;(IPC1-7):G03F7/11 主分类号 G03F7/11
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