发明名称 |
Radiation sensitive resin composition |
摘要 |
A radiation sensitive resin composition comprising (A) a fluorine-containing copolymer of hexafluoropropylene, at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and an unsaturated compound (B) an acid generating compound which generates an acid upon exposure to radiation; (C) a cross-linkable compound; and (D) an organic solvent. The composition suitable is useful for a negative resist for forming a mask for the production of a circuit such as a semiconductor integrated circuit or a thin film transistor circuit for liquid crystal displays as well as a material for forming a permanent film such as an interlaminar insulating film or a color filter protective film.
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申请公布号 |
US5958648(A) |
申请公布日期 |
1999.09.28 |
申请号 |
US19980082192 |
申请日期 |
1998.05.21 |
申请人 |
JSR CORPORATION |
发明人 |
NISHIMURA, ISAO;ENDO, MASAYUKI |
分类号 |
G03F7/004;G03F7/038;H01L21/027;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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