发明名称 Plating process for fine pitch die in wafer form
摘要 Apertures in a tape formed on a substrate allow straight plating of solder bumps to heights above 4 mils. The solder bumps are combined with a lower density material to form an hourglass-shaped structure which allows interconnections to bonding pads of electronic components with pitches less than 9 mils.
申请公布号 US5957370(A) 申请公布日期 1999.09.28
申请号 US19970781740 申请日期 1997.01.10
申请人 INTEGRATED DEVICE TECHNOLOGY, INC. 发明人 GALLOWAY, TERRY R.
分类号 B23K3/06;H05K3/00;H05K3/34;(IPC1-7):B23K31/02 主分类号 B23K3/06
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