,申请号JP19900133990-传众专利搜索

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法人/股东/高管

发明名称
摘要	<p>A stainproof protector for preventing a mask for lithography from staining, which has a protective film made of a polymer having a fluorine-containing aliphatic cyclic structure.</p>
申请公布号	JP2952962(B2)	申请公布日期	1999.09.27
申请号	JP19900133990	申请日期	1990.05.25
申请人	ASAHI GARASU KK	发明人	KAWASAKI TOORU;UNOKI MASAO;NAKAMURA HIDE
分类号	G03F1/62;H01L21/027;(IPC1-7):G03F1/14	主分类号	G03F1/62
代理机构		代理人
主权项
地址

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