发明名称 APPARATUS FOR PRODUCING SAMPLE AND METHOD FOR PRODUCING SAMPLE
摘要 <p>PROBLEM TO BE SOLVED: To make, analyze, observe and measure a sample by one apparatus by setting a transfer means which has an irradiation optical system, a secondary particle detection means and a deposit gas source and moves an extracted sample obtained by separating a part on a sample to a sample holder, and a sample stage for mounting a test piece and the extracted sample thereon. SOLUTION: A sample-forming apparatus 1 includes a focused ion beam(FIB) irradiation optical system 2, a secondary particle detector 3, a deposit gas source 4, a sample stage 7, a transfer means 8, etc. The FIB irradiation optical system 2 emits ion beams from a liquid metal ion source 20 and scans an FIB 24 on a test piece with the use of a polarizer 25, thereby processing a sample surface. The secondary particle detector 3 detects secondary electrons and secondary ions generated when the FIB is irradiated and forms an image of the electrons and ions, so that a probe, a surface of the test piece, a process area, etc., are observed. The sample stage 7 of a side entry type can be inserted to a sample chamber 9 without freeing vacuum in the sample chamber 9 or pulled out of the sample chamber without breaking vacuum.</p>
申请公布号 JPH11258130(A) 申请公布日期 1999.09.24
申请号 JP19980057718 申请日期 1998.03.10
申请人 HITACHI LTD 发明人 UMEMURA KAORU;TOMIMATSU SATOSHI
分类号 G01N23/225;G01N1/28;G01N1/32;G01N23/227;G01N37/00;G01Q30/20;G01Q90/00;(IPC1-7):G01N1/32 主分类号 G01N23/225
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