| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. capable of reducing problems on industrial safety-hygiene, environmental pollution, fire prevention, etc., due to the vaporization of an org. solvent in a process for forming a coating film by coating on a substrate and pre-drying, useful as a photoresist ink for the production of a printed circuit board such as an etching resist ink or a plating resist ink, capable of being made aqueous and developable with water or an aq. dilute alkali soln. SOLUTION: The photosensitive resin compsn. contains (A) a water-soluble photosensitive resin obtd. by introducing styryl pyridinium or styryl quinolinium groups into a polyvinyl alcohol polymer or a water-soluble photosensitive resin obtd. by adding an N-alkylol (meth)acrylamide to a polyvinyl alcohol polymer, (B) a photosensitive prepolymer having both one carboxyl group and at least two ethylenically unsatd. groups in one molecule, (C) a photopolymn. initiator and (D) water.</p> |
