发明名称 |
OBJECT FOR MANUFACTURING LINE CLEANING, WASHING METHOD OF OBJECT FOR MANUFACTURING LINE CLEANING AND OPERATION METHOD OF MANUFACTURING LINE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent attaching of fine particle to a wafer even if a manufacturing line is used for a long period or a large quantity of fine particle is suddenly generated, by carrying out an object with charging property together with an object in a manufacturing process by a carrying part. SOLUTION: A dummy cassette 21 with charging property is formed of polypropylene of surface specific resistance value of 10<12>Ωor more. The dummy cassette 21 with charging property is made to flow between conductive wafer cassettes 10 which carry a product wafer. Then, the dummy cassette 21 with charging property electrically attracts floating matter and fine particle existing on a manufacturing line 1 by electrostatic attraction force thereof. Meanwhile, the conductive wafer cassette 10 does not attract floating matter and fine particle existing on the manufacturing line 1 electrically. As a result, it is possible to prevent attaching of fine particle to a wafer even if a manufacturing line is used for a long period or a large quantity of fine particle is suddenly generated.</p> |
申请公布号 |
JPH11260900(A) |
申请公布日期 |
1999.09.24 |
申请号 |
JP19980061442 |
申请日期 |
1998.03.12 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
HIRANO NORIKO;FUJINO NAOHIKO |
分类号 |
B08B1/00;B65G43/00;H01L21/02;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
B08B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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