发明名称 Wafer treating apparatus
摘要 On a hot plate, jigs and wafers are joined by bonding wax. A first transport mechanism, a posture change mechanism, a pusher and a second transport mechanism transport the jigs joined with the wafers from the hot plate to a treating transport mechanism. The treating transport mechanism immerses the jigs joined with the wafers in a treating solution stored in a treating tank. Thus, the wafers may be thinned, or otherwise treated, without a turn table directly contacting and damaging the wafers as in the prior art.
申请公布号 US2006191635(A1) 申请公布日期 2006.08.31
申请号 US20060362635 申请日期 2006.02.27
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 HASEGAWA KOJI;MORITA AKIRA;ARAI KENICHIRO
分类号 H01L21/306;C23F1/00 主分类号 H01L21/306
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