| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing method which maintains even concentration of developer and smoothly realizes transition from a developing operation to a rinsing operation. SOLUTION: In a developing operation, merely pure water is firstly supplied on the surface of a wafer W, mixture 74 of developer and pure water is supplied while the mixture ratio of the developer is gradually increased, and then, the pure water supplied on the surface of the wafer W is replaced with the developer. In a rinsing operation, the mixture 74 of developer and pure water is supplied while the mixture ratio of the developer is gradually reduced, and the developer supplied on the surface of the wafer W is replaced with pure water. A solution supply nozzle, which supplies developer onto the surface of the wafer W, also supplies pure water and the mixture 74 of developer and pure water. |
