发明名称 SUBSTRATE MARKING METHOD AND SUBSTRATE INSPECTING METHOD AND SUBSTRATE INSPECTING DEVICE USED FOR THE METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate marking method, substrate inspecting method, and substrate inspecting device used for this, in which the efficiency of a defective confirming work and the improvement of an activity ratio through automatic alignment can be attained, and the defective information of a substrate without pattern can be used for the following processes. SOLUTION: This method inspects the defects of a glass substrate 9, and includes a process for marking the surface of a glass substrate 9 by the use of a laser (a), a process for aligning the glass substrate 9 by the use of a mark applied by the marking (b), and a process for inspecting the defects of the glass substrate 9.</p>
申请公布号 JPH11260868(A) 申请公布日期 1999.09.24
申请号 JP19980061773 申请日期 1998.03.12
申请人 ADVANCED DISPLAY INC 发明人 ICHIHARA MIWAKO;MATSUI YASUSHI
分类号 B23K26/00;G01N21/88;G01N21/93;G01N21/958;G01R31/00;G02F1/1333;H01L21/027;H01L21/66;(IPC1-7):H01L21/66;G02F1/133 主分类号 B23K26/00
代理机构 代理人
主权项
地址