发明名称 METHOD AND APPARATUS FOR EVALUATING PATTERN
摘要 PROBLEM TO BE SOLVED: To evaluate the edge roughness of a pattern quantitatively. SOLUTION: Two reference points are selected from an evaluating pattern. Next, the interval between the selected two reference points is divided into one-hundred equal parts, and a one-hundred measuring points are set. Next, each measuring point is scanned by an electronic beam (S1), and a plurality of secondary electronic waveform data obtained are stored respectively (S2). These two-dimensional electronic waveform data are transformed into position coordinates (S3), and a cumulated waveform is obtained by superposition computation processing (S4). Attension is paid to the position of one out of the two peaks of the cumulated waveform, and a waveform larger than some threshold value of the waveform is approximated by a normal distribution function, and edge roughness evaluation is performed fromσ-value.
申请公布号 JPH11257940(A) 申请公布日期 1999.09.24
申请号 JP19980065345 申请日期 1998.03.16
申请人 TOSHIBA CORP 发明人 NAKASUGI TETSUO;SHIOBARA HIDESHI;YAMAZAKI YUICHIRO;SUGIHARA KAZUYOSHI
分类号 G01B15/00;G03F7/26;(IPC1-7):G01B15/00 主分类号 G01B15/00
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