发明名称 POLYMER-INORGANIC MULTILAYER DIELECTRIC FILM
摘要 A multilayer dielectric film structure includes a pair or plurality of materials at least one being a polymer and the other of high index of refraction inorganic material (compared to the polymer) at the wavelengths of interest. The structure is fabricated by a combination of layering techniques, one of which is used to create a layer of the polymer, the other being used to deposit the inorganic component. The assembly process yields a structure of alternating polymer and inorganic layers of high index of refraction (compared to air). The structure preferably will reflect light within a certain frequency range of any polarization and at a continuum of angles of incidence ranging from normal to oblique. In a particular embodiment of the invention, the structure includes alternating layers of a polymer, e.g., polystyrene and Tellurium.
申请公布号 WO9947465(A1) 申请公布日期 1999.09.23
申请号 WO1999US05491 申请日期 1999.03.12
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 FINK, YOEL;THOMAS, EDWIN, L.;WINN, JOSHUA;FAN, SHANHUI;CHEN, CHIPING;JOANNOPOULOS, JOHN, D.
分类号 B32B7/02;B32B9/00;C03C17/42;G02B5/08;G02B5/26;G02B5/28;G02B5/30 主分类号 B32B7/02
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