发明名称 Vorrichtung zum Aufwachsen von Stoffen aus der Gasphase
摘要 In an apparatus for vapor-phase growth which comprises a reactor having an inlet for the introduction of the gas containing a source material on its top and a susceptor provided in the downstream portion of the reactor, the improvement wherein the susceptor is generally in a conical or polygonal pyramid form consisting of an upper rectifying portion and a lower substrate holding portion, with the diameter of the susceptor in its lower portion increasing by a greater degree than in its upper portion.
申请公布号 DE3838164(C2) 申请公布日期 1999.09.23
申请号 DE19883838164 申请日期 1988.11.10
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 MAEDA, TAKAYOSHI;HATA, MASAHIKO;ZEMPO, YASUNARI;FUKUHARA, NOBORU;TAKATA, HIROAKI
分类号 H01L21/205;C23C16/458;C30B25/02;C30B25/08;C30B25/12;C30B25/14 主分类号 H01L21/205
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