发明名称 |
Vorrichtung zum Aufwachsen von Stoffen aus der Gasphase |
摘要 |
In an apparatus for vapor-phase growth which comprises a reactor having an inlet for the introduction of the gas containing a source material on its top and a susceptor provided in the downstream portion of the reactor, the improvement wherein the susceptor is generally in a conical or polygonal pyramid form consisting of an upper rectifying portion and a lower substrate holding portion, with the diameter of the susceptor in its lower portion increasing by a greater degree than in its upper portion. |
申请公布号 |
DE3838164(C2) |
申请公布日期 |
1999.09.23 |
申请号 |
DE19883838164 |
申请日期 |
1988.11.10 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
MAEDA, TAKAYOSHI;HATA, MASAHIKO;ZEMPO, YASUNARI;FUKUHARA, NOBORU;TAKATA, HIROAKI |
分类号 |
H01L21/205;C23C16/458;C30B25/02;C30B25/08;C30B25/12;C30B25/14 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|