发明名称 SUBSTRATE FOR PATTERNING THIN FILM AND SURFACE TREATMENT THEREOF
摘要 A display, such as an EL device having little variation in film thickness between pixels, and a color filter are disclosed. Arranged on a substrate are pixels formed by an ink-jet method in regions to be coated and partitioned by banks so formed as to satisfy the formulae a>d/4, d/2<b<5d, c>t0, c>(1/2)x(d/b) where a is the width of the banks, c is the height of the banks, b is the width of the regions to be coated, d is the diameter of droplets of a liquid material for forming a thin film, and t0 is the thickness of the thin film. A method of modifying the surface is a method comprising forming banks of an organic martial on an inorganic bank forming surface, and performing a plasma processing under an excessive fluorine condition, or a method comprising performing oxygen gas plasma processing of a substrate having banks formed of an organic material, and then performing fluorine-based gas plasma processing.
申请公布号 WO9948339(A1) 申请公布日期 1999.09.23
申请号 WO1999JP01327 申请日期 1999.03.17
申请人 SEIKO EPSON CORPORATION;SEKI, SYUNICHI;KIGUCHI, HIROSHI;YUDASAKA, ICHIO;MIYAJIMA, HIROO 发明人 SEKI, SYUNICHI;KIGUCHI, HIROSHI;YUDASAKA, ICHIO;MIYAJIMA, HIROO
分类号 G02B5/20;G09F9/00;G09F9/30;G09F9/33;H01L27/32;H01L33/26;H01L33/42;H01L33/48;H01L51/00;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/10;H05B33/12;H05B33/14;H05B33/22;(IPC1-7):H05B33/22;H01L27/15;H01L29/78 主分类号 G02B5/20
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