发明名称 |
Silicon single crystal and method for producing the same |
摘要 |
<p>There are disclosed a method for producing a silicon single crystal by growing the silicon single crystal based on a magnetic field applied Czochralski method, characterized in that the single crystal is grown at a high growth rate satisfying the equation: Vave >/= 120/r where Vave denotes an average crystal growth rate Ämm/minÜ, and r denotes a radius of the single crystal ÄmmÜ, and a rotation number R ÄrpmÜ of the single crystal in growing satisfies the equation: R </= 1250/r, and a silicon single crystal, characterized in that oxygen concentration in-plane distribution is 10% or less, and deformation ratio of constant diameter portion in the silicon single crystal in a direction perpendicular to crystal growth axis direction is 5% or less. There are provided a method capable of producing a silicon single crystal having a high uniformity of oxygen concentration in-plane distribution without deformation of crystal even if the crystal is grown at a growth rate exceeding the upper limits found in conventional techniques, and a silicon single crystal of high quality.</p> |
申请公布号 |
EP0943703(A2) |
申请公布日期 |
1999.09.22 |
申请号 |
EP19990104482 |
申请日期 |
1999.03.05 |
申请人 |
SHIN-ETSU HANDOTAI COMPANY LIMITED |
发明人 |
HOSHI, RYOJI;INOKOSHI, KOUICHI;OHTA, TOMOHIKO |
分类号 |
C30B15/00;C30B15/30;C30B29/06;C30B33/04;(IPC1-7):C30B15/00 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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