发明名称 Silicon single crystal and method for producing the same
摘要 <p>There are disclosed a method for producing a silicon single crystal by growing the silicon single crystal based on a magnetic field applied Czochralski method, characterized in that the single crystal is grown at a high growth rate satisfying the equation: Vave >/= 120/r where Vave denotes an average crystal growth rate Ämm/minÜ, and r denotes a radius of the single crystal ÄmmÜ, and a rotation number R ÄrpmÜ of the single crystal in growing satisfies the equation: R </= 1250/r, and a silicon single crystal, characterized in that oxygen concentration in-plane distribution is 10% or less, and deformation ratio of constant diameter portion in the silicon single crystal in a direction perpendicular to crystal growth axis direction is 5% or less. There are provided a method capable of producing a silicon single crystal having a high uniformity of oxygen concentration in-plane distribution without deformation of crystal even if the crystal is grown at a growth rate exceeding the upper limits found in conventional techniques, and a silicon single crystal of high quality.</p>
申请公布号 EP0943703(A2) 申请公布日期 1999.09.22
申请号 EP19990104482 申请日期 1999.03.05
申请人 SHIN-ETSU HANDOTAI COMPANY LIMITED 发明人 HOSHI, RYOJI;INOKOSHI, KOUICHI;OHTA, TOMOHIKO
分类号 C30B15/00;C30B15/30;C30B29/06;C30B33/04;(IPC1-7):C30B15/00 主分类号 C30B15/00
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